* (xing) P(gun)]
zt Photomask substrates
ӆ؛Ƭ
r(ji)
1
300.00Ԫ/
(yng)(bio)}zt Photomask substrates
r(ji)늃x
l(f)˾|ݸк\(chng)W(xu)Ʒ˾
؛10000000
(lin)ϵˣС
l(f)؛c(din)V| |ݸ |ݸ
l(f)r(sh)g20210531
Ч20211130
ھԃ(xn)P(pn)ھԃ(xn)P(pn)
a(chn)ƷCϢ|(zh)δӋ(j)
Ϣ
zt Photomask substrates
Ԕ(x)f(shu)
ztһNӲģϣĤǮ(dng)ǰδ(li)(x)ӹĤйϣஔ(dng)õĸйzƽġ߹❍ȵIJͨ^(gu)ֱſ؞R䣨SPeϵt-tĤγtĤͿһӹ¿gַQ(chng)zgƳɄzt档ztĤĻģ
ԣztиߵĸй`߷ֱȱc(din)ܶĥԺá坍̎ʹÉL(zhng)c(din)
(yng)
a(chn)ƷV(yng)ڰ댧(do)w·оƬ졢·ܶ댧(do)wԪ@ʾW(xu)ИI(y)Ĥ桢ܶӡƾ·壨PCBИI(y)
|ݸк\(chng)W(xu)Ʒ˾Ϣ
\(chng)W(xu)Ʒ˾2004꣬һн(jng)(yn)O(sh)Ӌ(j)W(xu)ĸ߿ƼI(y)˾(jng)^(gu)İl(f)չγ˼аl(f)O(sh)Ӌ(j)졢ӹz(yn)Mbۺ(w)һwϵаW(xu)(zhn)_a(chn)O(sh)䣬(li)ͨ^(gu)(sh)ʩƌW(xu)Ĺwϵ˾߂Ѹٷ(yng)Ј(chng)a(chn)˾Ўʮ˽MɵO(sh)Ӌ(j)аl(f)(du)Ϯa(chn)Ʒ(j)͑(h)Ҫаl(f)®a(chn)ƷõĹW(xu)O(sh)䣬N͑(h)O(sh)Ӌ(j)Aˇ(gu)(ni)͑(h)ه(li)ҹ˾ڇ(gu)(ni)Ј(chng)кܸߵռh(yun)N(xio)(gu)Wձn(gu)|ρЖ|ء^s@|ݸӋ(j)Ժ(w)I(y)Ї(gu)Ӌ(j)ƌW(xu)оԺ(bio)(zhn)ߺI(y)Ї(gu)L(zhng)C(j)(sh)@g(sh)˾A|Aυ^(q)Șsu(y) ˾ͨ^(gu)L(zhng)cW(xu)xW(xu)C(j)еO(sh)I(y)γϵлW(xu)a(chn)ƷY(ji)(gu)O(sh)Ӌ(j)ܸ(j)͑(h)ӆƸN(zhn)_W(xu)˾Įa(chn)Ʒ:R^ųy(c)ֳyУƬ(bio)壩ƽƽƽNRpRRRք塢_(ti)ͶӰ(sh)@aȮa(chn)Ʒнb䓻ɫĥɰпղNˇb̡ ˾ʼKء|(zh)ǰÑ(h)ϣ\(chng)ȡšּ\(chng)(gu)(ni)͑(h)ṩĮa(chn)Ʒ͵ķ(w)Қgӭѵ˾(li)늻(li)ǢՄI(y)(w)yֹM(jn)(chung)xͣ
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